2008 Rigaku TXRF 300S

Condition: “As is” 
Date of manufacture:2008

Wafer size 200 (150-300)mm 

300, 200, 150mm

TXRF analysis can gauge contamination in all

fab processes, including cleaning, litho, etch,

ashing, films, etc. The TXRF 300 Fab can

measure elements from Na through U with a

single-target, 3-beam X-ray system and a liquid

nitrogen-free detector system.

The TXRF 300 Fab includes Rigaku's patented

XYθ sample stage system, an in-vacuum wafer

robotic transfer system, and new user-friendly

windows software. All of these contribute to

higher throughput, higher accuracy and

precision, and easy routine operation.

Optional Sweeping TXRF software enables

mapping of the contaminant distribution over

the wafer surface to identify "hot spots" that

can be automatically re-measured at higher

precision.