GSI ULTRADEP 1000 PVD System

GSI ULTRADEP 1000 PVD System For sale is a GSI PVD Ultradep 1000 which is Used and in very good condition. Contact ollie@tarasemi.com for more information. Recipe driven automated controls SiO2 and Si3N4 films, amorphous Si 8” wafer capability Specifications : SiO2 rates:  Lo@1000 angs./min.   Hi@3000 angs./min Si3N4 rate: 350 angs./min. Alpha Si rate:  (currently unavailable) Gases:  SiH4 5%/He bal., N2, O2, N2O, He

A separate Gas panel which was used with this system will also be included,

See photo's for details