1995 Plasma-Therm I.P. Inc. 790 Etch

1995 Plasma-Therm I.P. Inc. 790 Etch

Contact us for price

orCall +353 (0) 87 192 1110

Description

Plasma-Therm I.P. Inc. 790 Etch Multi-Process Etch 

EQUIPMENT DETAILS:

Inspect to confirm configuration and condition.

The system is not on-line. Install Type is Stand-Alone.

The equipment is suitable for processes of oxide, SiN, silicon, metal etch.

The gas used contains O2, N2, CHF3, SF6.

The pump is Lyebold (Model: D25BCS) and will be move out with the equipment.

The chiller is NESLAB (model: CFT75) that the current status is damaged and it will be move out with the equipment.

Specifications

ManufacturerPlasma-Therm I.P. Inc.
Model790 Etch
Year1995
ConditionUsed
Stock Numberem1122
WAFER SIZE200mm