2007 Tokyo Electron Ltd. Trias Ti/TiN

2007 Tokyo Electron Ltd. Trias Ti/TiN
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Description
Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
Currently Configured for 300mm wafer size
MFG Date: September 26, 2007
EQUIPMENT DETAILS:
Tool has been de-installed and is currently located in an off-site warehouse.
Shipping brackets and kits will need to be supplied by buyer.
DEADLINE FOR TOOL'S REMOVAL: NOVEMBER 15, 2019.
Pictures : Please see.
Additional CONFIGURATION DETAILS: Please ask your sales person.
Missing or damaged parts: Not reported. Please inspect to confirm.
[PM-1]
Process:SFD-TiN
Gas(sccm):
Ticl4(100),ClF3(500),N2(600/1000/2000),NH3(5000/300),N2(300/600/2000)
[PM-2]
Process:HT-Ti
Gas(sccm):
Ticl4(20),ClF3(500),Ar(300/2000),H2(5000),NH3(600/2000),N2(2000)
[PM-3]
Process:SFD-TiN
Gas(sccm):
Ticl4(100),ClF3(500),N2(600/1000/2000),NH3(5000/300),N2(300/600/2000)
[PM-4]
Process:HT-Ti
Gas(sccm):
Ticl4(20),ClF3(500),Ar(300/2000),H2(5000),NH3(600/2000),N2(2000)
Specifications
Manufacturer | Tokyo Electron Ltd. |
Model | Trias Ti/TiN |
Year | 2007 |
Condition | Used |
Stock Number | em1196 |
WAFER SIZE | 300mm |