2007 Tokyo Electron Ltd. Trias Ti/TiN

Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)

Currently Configured for 300mm wafer size

MFG Date: September 26, 2007

EQUIPMENT DETAILS:

Tool has been de-installed and is currently located in an off-site warehouse.

Shipping brackets and kits will need to be supplied by buyer.

DEADLINE FOR TOOL'S REMOVAL: NOVEMBER 15, 2019.

Pictures : Please see.

Additional CONFIGURATION DETAILS: Please ask your sales person.

Missing or damaged parts: Not reported. Please inspect to confirm.

[PM-1]

Process:SFD-TiN

Gas(sccm)：

Ticl4(100),ClF3(500),N2(600/1000/2000),NH3(5000/300),N2(300/600/2000)

[PM-2]

Process:HT-Ti

Gas(sccm)：

Ticl4(20),ClF3(500),Ar(300/2000),H2(5000),NH3(600/2000),N2(2000)

[PM-3]

Process:SFD-TiN

Gas(sccm)：

Ticl4(100),ClF3(500),N2(600/1000/2000),NH3(5000/300),N2(300/600/2000)

[PM-4]

Process:HT-Ti

Gas(sccm)：

Ticl4(20),ClF3(500),Ar(300/2000),H2(5000),NH3(600/2000),N2(2000)