• 3-station process module (P1, P2, P3) • 5 kW pulsed DC power supply • P3 dedicated to ITO or ...

• 3-station process module (P1, P2, P3) • 5 kW pulsed DC power supply • P3 dedicated to ITO or ...

- With process gases BCl₃, Cl₂, SiCl₄, CF₄, SF₆, C₄F₈, O₂, and Ar, this versatile ICP etcher is d...

Meyer Burger AK800 Configuration overview • Versatile ICP etcher to anisotropically etch most th...

Consisting of the main unit, 3 chemical cabinets and sub-equipment Description SEZ 304 Wafer Si...

Manufacturer: Edwards Model: Auto 500 The unit includes 2 heavy duty transformers, 1 BOC Edward...

Technical Specification – Etch Tool System Model: LAM Rainbow XL (45xx Series) Specific Model: ...

Qty: 2 490 Plasma Etcher w/ ENI OEM-6M-01, M&W Chiller Sold As Is

Refurbished Bio-Rad/ Accent QS2200A FTIR systems. typically used for EPI, BPSG, SIN, CO applicat...

KLA eS32 E-beam Wafer Inspection 200mm eS32 is a top-of-the-line mask and wafer inspection equip...

Condition: As is Process:metal etcher 12" Main frame type:centura AP Factory interface: Descr...

High temperature magnetic vacuum annealing furnace (max tep 650F) engineered by Dicon Engineerin...