LAM/ Novellus Concept One-200 PECVD TEOS

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Currently Configured for: 200mm

PSG Deposition

Software: 4.433

Chuck Type/Material: Aluminum

Novellus TEOS cabinet

2 Porter 2000s, 3 units 1660s, 2 Horiba 500s

Novellus C1 standard robot

Dry Pumps:

1 Edwards IXH1210, 1 Edwards IQDP80

Edwards Atlas Abatement