2014 LAM/ Novellus Concept One-200 PECVD TEOS

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Date of Manufacture: 2014-05-08

Currently Configured for: 200mm

PSG Deposition

Software: 4.433

Chuck Type/Material: Aluminum

Endpoint system

CSM NV6 TEOS cabinet

2 Porter 2000s, 11 Horiba 500s

Novellus C1 standard robot

Dry Pumps:

1 Edwards IXH1210, 1 Edwards IQDP80

Edwards Atlas Abatement

Damaged/Missing Parts:

Down Hard (PM7 controller)