Oxford Plasmalab 100 PECVD System

Oxford Plasmalab 100 PECVD System
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Description
Advanced PECVD system for thin film deposition and etch applications
Key Features:
Oxford instruments plasmalab system 100
Comdel LF generator upgrade- first solar part number 94-219969U1
PC2003 RF generator interface architecture
Multiple RF chammels for independent process control
Integrated power distribution and matching network
Reliable Oxford Instruments Technology built for demanding environments
Specifications
| Manufacturer | Oxford |
| Model | Plasmalab 100 PECVD System |
| Condition | Used |
| Stock Number | BM6898 |















