Solitec 5110 Single Head Wafer Processing Photoresist Spin Coate

Designed to coat wafers, masks and substrates. Simple design for low maintenance easy serviceability and high up-timer. Acceleration 1,000 to 40,000 rpm/sec. Digital display/timer with manual programming. Capable of 9 in. round, 6 in. square or 9 in. diagonal for rectangular substrate. 120V. Does not include resist dispense pump or parts.