2005 Applied Materials Centura AP Ultima X

2005 Applied Materials Centura AP Ultima X

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Description

Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition)

Currently Configured for 300mm wafer size

MFG Date: 2005

EQUIPMENT DETAILS:

Tool has been de-installed and is stored in an off-site warehouse.

Shipping brackets and kits will need to be supplied by buyer.

A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.

[Ch-A]

Process:STI

Gas(sccm):

O2(1000),NF3(100/3000),He(600/400),SiH4(300/50),H2(1000/1000),Ar(1000/100/3000)

[Ch-B]

Process:STI

Gas(sccm):

O2(1000),NF3(100/3000),He(600/400),SiH4(300/50),H2(1000/1000),Ar(1000/100/3000)

[Ch-C]

Process:STI

Gas(sccm):

O2(1000),NF3(100/3000),He(600/400),SiH4(300/50),H2(1000/1000),Ar(1000/100/3000)

Specifications

ManufacturerApplied Materials
ModelCentura AP Ultima X
Year2005
ConditionUsed
Stock Numberem1190
WAFER SIZE300mm