2000 TEL ALPHA-8SE

Condition:

Refurbished

It was refurbished in 2020 and installed, but had fewer than 50 runs completed before the project was cancelled.

Operational Status:

Deinstalled / Uncrated

Vintage:

2000

-Vintage refurbed by TEL in 2018

Basic details include:

Base unit ONO process.

Type I deep bay frame

Waves controller

PAC (Pre-Activation Chamber for N20 cracking)

Wafer Diameter: 200 mm

Load: 170 slot boat (150 wfr load size) with boat rotation

Heater element: 500C – 1000C

Process gases: NH3, DCS, N2O, N2

History: Installed for ONO gate capability, process gases run under engineering, never qualified for production.OEM Model Description

The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.