Oxford Plasmalab 100 PECVD System

Oxford Plasmalab 100 PECVD System

Contact us for price

Description

Advanced PECVD system for thin film deposition and etch applications


Key Features:

Oxford instruments plasmalab system 100

Comdel LF generator upgrade- first solar part number 94-219969U1

PC2003 RF generator interface architecture

Multiple RF chammels for independent process control

Integrated power distribution and matching network

Reliable Oxford Instruments Technology built for demanding environments

Specifications

ManufacturerOxford
ModelPlasmalab 100 PECVD System
ConditionUsed
Stock NumberBM6898