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Tel FORMULA
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Condition: as is
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2003 TEL FORMULA
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Wafer size: 300mm Category: diffusion Process: ALO Furnace Pics 1-8 = tool 1 Pics 9-16 = tool 2
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2010 TEL INDY PLUS
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Process: BCD PLOY Condition: AS-IS Wafer size: 12"
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TEL Trias SPA
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Type: Chemical Vapor Deposition (CVD) Equipment Configuration: – 2 Chambers
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2006 TEL α-303I
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Vintage: 2006 (2) 2004 (1) Wafer size: 300mm Process: DIFF
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2008 TEL TRIAS
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Category: thin film CVD Process: PECVD-Oxynitride Wafer size: 300mm
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2006 TEL Indy
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Process: DIFFUSION Wafer Size: 300mm Category: diffusion Equipment: furnace Process: anneal
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2011 TEL INDY PLUS
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Process: DIFFUSION Wafer Size: 300mm Equipment: furnace Process: HfO2-ALD
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2003 TEL TRIAS
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Wafer Size: 300mm Process: CVD Category: Thin film
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2007 TEL INDY
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Process: DIFFUSION Wafer Size: 300mm Category: Diffusion Furnace Process: ALD SiN
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2004 TEL A303I
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Wafer size: 12" Diffusion Furnace Process: LTO POLY
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2006 TEL Lithius Track
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Wafer Size Range Set Size 300 mm Number of Tracks 1 Year of Manufacture 2006 Condition Good ...
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