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12" WAFER 4 available As-is

System accuracy: < 5 μm 3σ Printable area: 327 x 227 mm (DIN A4) Substrate thickness: max. 25 m...

Operating temperatures from 5°C above room temperature up to 250°C Capacity: 115 L Natural air ...

The Spin Rinse Dryer is used for rinsing and drying substrates. Max. size: 8" low profile, NOT A...

Up to 12" - The Spin Rinse Dryer is used for rinsing and drying substrates up to 12" round or 7"...

- thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 2...

• climate and humidity testing, with or without irradiation • e.g. to test different climatic zo...

Cold light source Olympus KLA 1500 LCD (many) with ring light and cable The KL 1500 LCD halogen ...

Zeiss Stemi 2000 with a cold light source and fiber optic cable and even the accessories for tran...

SUSS MA6 ALIGNER TSA/BSA - Remanufactured to new condition basic system prepared for manual alig...

2008 No feeders As is running condition

Mask Aligner Karl Suss MA 100e/150e (refurbished by expert), TSA, up to 4”, or 6” Wafer or Substr...