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ASM Furnace Vertical - Advance 400 2 Reactor atmospheric Robot defect and need service Wafer S...

OFENV01D Furnace with 2 Tubes 1x Reactor Dot. Poly Low Pressure 1x Reactor Atmosphere WET-OXID...

i-Line Stepper Lithography Equipment Date of Manufacture: 2017-01-01 Currently Configured for:...

Coat only Track Resist Processing Equipment Date of Manufacture: 2019-01-01 Currently Configur...

Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2017-01-01 Currently C...

PVD (Physical Vapor Deposition) Deposition Equipment Date of Manufacture: 2020-01-01 Currently...

Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Condition Good Year of Manufact...

Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage...

2 available WET Clean Strip (8''tool) Year of Manufacture 1999 & 2000 Condition Fair Exterior...

PVD Wafer transfer

2015 vintage

Condition: De-installed with missing parts