PVA TePla AG Plasma System GIGAbatch 380P Year of construction: 2010 O2 and N2 Supply Voltag...

Applied Materials AMAT 0190-15066 300MM MAX EMISSOMETER LOW EMISSIVITY WAFER NEW

- With process gases BCl₃, Cl₂, SiCl₄, CF₄, SF₆, C₄F₈, O₂, and Ar, this versatile ICP etcher is d...

Meyer Burger AK800 Configuration overview • Versatile ICP etcher to anisotropically etch most th...

Technical Specification – Etch Tool System Model: LAM Rainbow XL (45xx Series) Specific Model: ...

2 available RESIST CLEAN, CU 300mm WAFER SIZE: 300mm

A MXP ETCH B MXP ETCH C MXP ETCH Good Condition WAFER SIZE: 150mm

Applied Materials 5200 Centura - WCVD Vintage: 1996 Wafersize: 150mm 200mm convertible: Yes C...

Applied Materials 8330 Metal Etch 150 mm system for etching Metal 3 available

Configuration: - Cassette to Cassette Single Wafer Etcher - ESC - Classic - Particle reductio...

Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 1...

Condition: fully refurbished to OEM Specs. 1. Model : TCP9600SE with DSQ & APM 2. System Serial...