EVG Lithoscale - Maskless Exposure System Up to 300mm, Low-Volume Manufacturing, automated subst...

- Equipment for automated stencil printing - Designed for automated input and output - Printing f...

westbond 7200A 1 sets . microsope for the SZ 51 olympus 1 sets 2inch workhoder number heater 1...

nearly in new condition currently installed and in production state Maximum Temperature 260 ºC ...

Maximum Temperature 260 ºC (500 ºF, 533 ºK) Power Requirements 380 V CE Marked YES Year of Man...

The system was in production until February 2025. Wafer Size Range Minimum 150 mm Maximum 150 mm...

The system was in production until February 2025. Wafer Size Range Minimum 150 mm Maximum 150 mm...

Canon FPA 3000 i5+ General Configuration: - FPA 3000 - i5(+) - Manufactured in June / 1997 - 8“...

CAI Canon FPA 3000 i5+ Description CAI518 Canon FPA 3000 i5+ Wafer Size Range Minimum 150 mm M...

'- 12" Standard Wafer Chuck and 12" wafer handling system - SMIF type reticle loading ports and ...

Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle majo...

Multi Purpose Analyzer brings new dimensions and flexibility to Near Infrared Spectroscopy. The ...