TBA for sale at Tara Semiconductor Technology — Page 139

Used KLA-Tencor Corp. RS-55TCA OmniMap

Resistivity Measurement Metrology Equipment Currently Configured for: 200mm Sheet Resistance ...

Used AMAT Endura 5500 Front-End Metallization

PVD (Physical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software:...

Used AMAT Endura 5500 Aluminum Interconnect

PVD (Physical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software:...

Used KLA-Tencor Corp. RS-55TCA OmniMap

Resistivity Measurement Metrology Equipment Currently Configured for: 200mm Sheet Resistance

Used 2000 ASM Advance 400

ASM Furnace Vertical - Advance 400 2x Reactor Dot. Poly Low Pressure Wafer Size Range Minimum ...

Used 1999 ASM Advance 400

ASM Furnace Vertical - Advance 400 2 Reactors atmospheric Wafer Size Range Minimum 150 mm Maxi...

Used 2008 ASM Advance 400

ASM Furnace Vertical - Advance 400 2 Reactor atmospheric Robot defect and need service Wafer S...

Used 1999 ASM Advance 400

OFENV01D Furnace with 2 Tubes 1x Reactor Dot. Poly Low Pressure 1x Reactor Atmosphere WET-OXID...

Used 2017 Canon FPA-3030 i5+

i-Line Stepper Lithography Equipment Date of Manufacture: 2017-01-01 Currently Configured for:...

Used 2019 Tokyo Electron Ltd. CLEAN TRACK ACT 8 COAT ONLY

Coat only Track Resist Processing Equipment Date of Manufacture: 2019-01-01 Currently Configur...

Used 2017 RENA Technologies GmbH RENA BatchW

Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2017-01-01 Currently C...

Used 2020 Polyteknik Flextura Sputter

PVD (Physical Vapor Deposition) Deposition Equipment Date of Manufacture: 2020-01-01 Currently...