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2003 TEL TRIAS
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Wafer Size: 300mm Process: CVD Category: Thin film
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2007 TEL INDY
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Process: DIFFUSION Wafer Size: 300mm Category: Diffusion Furnace Process: ALD SiN
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2008 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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2010 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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2006 AMAT CENTURA AP
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Wafer Size: 300mm Process: ETCH Category: Etch
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2002 Nanometrics SIPHER
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Wafer Size: 300mm Category: Metrology Concentration Process: PL Mapping
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2012 EO-Technics PEM402
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Process: Back-end Wafer size: 8" PKG
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2004 TEL A303I
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Wafer size: 12" Diffusion Furnace Process: LTO POLY
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JEOL JSM 6301 SEM
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- It was upgraded 5 years ago to Windows control, now running under Windows 10. - There is a thi...
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2010 SSEC M 3302
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Metal Etcher
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Verteq 1800-50 Single Stack Spin Rinser/Dryer (X3)
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Verteq 1800-50 Single Stack Spin Rinser/Dryer (X3) Verteq 1800-50 Spin Rinser/Dryer. A front-lo...
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Semitool ST-270D Spin Rinser/Dryer
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Semitool ST-270D Spin Rinser/Dryer
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