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2010 TEL INDY PLUS
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Process: BCD PLOY Condition: AS-IS Wafer size: 12"
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2013 PiNK V8-G-AUTO Plasma Cleaning System
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Very little used, in top condition Data sheet (in German) in attachment
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Applied Materials P 5000 Mark II-J
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Chemical Vapor Deposition (CVD) Wafer Size: Equipment Configuration: – SBC Board Model: SV21 –...
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TEL Trias SPA
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Type: Chemical Vapor Deposition (CVD) Equipment Configuration: – 2 Chambers
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Signatone CheckMate 250
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Type: Semi-Automatic Probe Station Wafer Size: 8"
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2005 Multitest MT 9918
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Handler
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1995 Hitachi S 4500
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Type: Field Emission Scanning Electron Microscope (FE-SEM)
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LAM Alliance 4.1 ICP Etcher 2set
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LAM Alliance 4.1 ICP Etcher 2set
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USHIO INC. uX-4440 Aligner
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USHIO INC. uX-4440 Aligner
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CHA Revolution E-Beam
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CHA Revolution E-Beam
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Ulvac ei-7K E-Beam
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Ulvac ei-7K E-Beam
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2012 Ulvac ENTRON-EX W300 Multi-chamber
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* Vintage : 2012 * 8 Chamber 12” * Condition : As-is
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