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2012 Karl Suss MicroTec Gamma 737 Coater Developer
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1995 NIKON NSR-2005 i8A
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Electric source (without/with) NEMA BOX / For (CVCF/UPS) / NEMA Switch(none/1/2) Chamber Type Ma...
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2007 TEL ALPHA-8SE-Z
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Process: SOD Power on, moving test done As-is Basic Configuration of Equipment Furnace System...
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NIKON I 12D
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Without any modifications or Refurbished 5", 6" or 8" wafer sizes, and Flat or notch wafers load...
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2016 Evatech BAK 901 Evaporation Tool
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Evaporation Lift off process type of calotte: Standard calotte 6” with 4 segments if it is suit...
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2007 Camtek Falcon 630
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Automatic Wafer Optical Inspection System Robot defect but machines works fine in manual mode
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Polaron Sputter coater
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Process Type: SEM metal and carbon sputter coater Range sputter coater
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NIKON NSR-SF200
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As-is condition
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2014 Karl Suss MA200 GEN3 Mask Aligner
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2012 HITACHI SU-8040
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Vintage: 2012 Process Type: FA SEMs/TEMs/Dual Beams Equipment Information: Status of Equipment...
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2017 Tokyo Electron Ltd. CLEAN TRACK ACT 8 MULTI BLOCK
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Multi Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 2017-01-...
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TEL a8SE
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Crated Name Tokyo Electron Limited 2-Equipement TypeDescription Alpha-8SE-ZVANS 3-Process Pro...
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