1996 Applied Materials 5200 Centura Dry Etch Cluster Tool

There are four chambers; 3 MxP+ oxide and 1 DPS poly

Applied Materials 5200 Centura Dry Etch Cluster Tool, 3ea process chamber+clean, w/ RF supply cabinet containing: 1ea RFPP LF10A RF supply, 1ea RFPP RF20R RF supply, 3ea ENO IEM-12B3 RF generators; power supply cabinet, 208V, 60Hz, 139kVA. Mfg 1996. Includes: 4ea BOC Edwards QDP80 vacuum pumps; 2ea BOC Edwards QDP40 vacuum pumps; 3ea Neslab HX 150-CHX recirculating chillers; 1ea Neslab Steelhead 1 CHX recirculating chiller.