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2005 Mattson Technology, Inc Aspen III ICPHT
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Mattson Technology, Inc. Aspen III ICPHT Stripper/Asher MFG Date: 2005 EQUIPMENT DETAILS: Mat...
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1997 AMAT SNNF Centura 4 Chamber Etch System
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Applied Material 200mm SNNF Centura 4 Chamber Etch System, 1997 YOM, Last in Production 2018, Pro...
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Applied Materials 8330
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Applied Materials 8330 Metal Etch 150 mm system for etching Metal
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2001 Tokyo Electron Ltd. NS 300
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Tokyo Electron Ltd. NS 300 Wafer Scrubber MFG Date: 2001 EQUIPMENT DETAILS: • Currently Config...
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2005 ENI 000-1103-083M1
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ENI(MKS) RF Generator ModelNo:000-1103-083M1 ※27MHzGen LamP/N:660-002294-100
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Applied Materials Centura AP Enabler
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Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size ...
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Shibaura Engineering Works Ltd. CDE-300
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Shibaura Engineering Works Ltd. CDE-300 Metal Etch Currently Configured for 300mm wafer size E...
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Tokyo Electron Ltd. Cellesta+
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Cellesta+ Tokyo Electron Ltd. Single Wafer Processing Etch/Clean - Wet Processing
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2007 P.S.K. Tech Inc Supra IV
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P.S.K. Tech Inc. Supra IV Stripper/Asher Currently Configured for 300mm wafer size MFG Date: 20...
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2008 PVA TePla 660 Microwave Plasma System (2008) for solar cell edge etching process -UNUSED-NEVER INSTALLED
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A special configuration of the PVA Tepla 660 used for the edge isolation etching process during s...
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Plasmatherm SLR 770 ICP Etcher - Remanufactured with ECT Upgrade
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Plasma-Therm SLR 770 ICP Etcher - Remanufactured with ECT Upgrade - Upgraded ICP Process Module ...
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LAM Rainbow 4420
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10 x lam 4420 ask for details
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