AMEC Primo SSC AD-RIE

AMEC 	Primo SSC AD-RIE
AMEC Primo SSC AD-RIIE Dielectric Etch Currently Configured for 300mm wafer size EQUIPMENT DET...

Applied Materials Centura AP Enabler

Applied Materials 	Centura AP Enabler
Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size ...

2007 P.S.K. Tech Inc Supra IV

2007 P.S.K. Tech Inc Supra IV
P.S.K. Tech Inc. Supra IV Stripper/Asher Currently Configured for 300mm wafer size MFG Date: 20...

Applied Materials Centura AP DPS II Polysilicon

Applied Materials Centura AP DPS II Polysilicon
Applied Materials Centura AP DPS II Polysilicon Polysilicon Etch Currently Configured for 300mm...

Shibaura Engineering Works Ltd. CDE-300

Shibaura Engineering Works Ltd. CDE-300
Shibaura Engineering Works Ltd. CDE-300 Metal Etch Currently Configured for 300mm wafer size E...

2005 Mattson Technology, Inc Aspen III ICPHT

2005 	Mattson Technology, Inc 	Aspen III ICPHT
Mattson Technology, Inc. Aspen III ICPHT Stripper/Asher MFG Date: 2005 EQUIPMENT DETAILS: Mat...

2014 P.S.K. Tech Inc Tigma N

2014 	P.S.K. Tech Inc 	Tigma N
P.S.K. Tech Inc. Tigma N Stripper/Asher Currently Configured for 300mm wafer size MFG Date: 20...

Lam Research 2300 SELIS - Chamber Only

Lam Research 	2300 SELIS - Chamber Only
LAM Research 2300 SELIS - Chamber Only Dielectric Etch WAFER SIZE: 300mm

Lam Research 2300e5 KIYO 45

Lam Research 	2300e5 KIYO 45
LAM Research 2300e5 KIYO 45 Polysilicon Etch EQUIPMENT DETAILS: 1. 2300 PLATFORM (E) 1. 3 FOU...

2004 Hitachi (Semiconductor) U-702

2004 	Hitachi (Semiconductor) 	U-702
Hitachi (Semiconductor) U-702 Metal Etch Currently Configured for 300mm wafer size MFG Date: 20...

2006 Applied Materials Centura AP eMax CT

2006 Applied Materials 	Centura AP eMax CT
Applied Materials Centura 4.0 eMax Dielectric Etch Currently Configured for 300mm wafer size MF...

2005 Mattson AST2900

2005 Mattson  AST2900
Mattson AST2900, Single Chamber RTP,