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2007 AMAT Centura Enabler Oxide Etch
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Tarasemi purchased this from GF in Europe. Tool Status Connected Wafer Size 300 mm Fab Section...
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1985 TEL UNITY M SCCM
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Plasma etcher Tool Status Connected Wafer Size 200 mm Fab Section Etch Asset Description TEL ...
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2005 ENI 000-1103-083M1 LAM P/N: 660002294R002 SN:507
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ENI(MKS) RF Generator ModelNo:000-1103-083M1 ※27MHzGen LamP/N:660-002294-100
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March PX-1000 Plasma Asher System
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- Model: PX-1000 - Shelves, controller, and internal MFCs - Does not include the MKS vapor flow...
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1995 AMAT P 5000
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Etcher, 8" - 2x Etch Chambers, 1x Aligning Chamber - DSP Chambers 1995 Vintage
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2001 STS MESC Multiplex ICP ASE
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STS ASE Multiplex ICP System (Bosch Process) OEM = Surface Technology Systems Limited (AKA: STS)...
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1998 Plasmatherm SLR-770 ICP
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Wafer Size: 100mm Category: Etch Equipment: ICP ETCH Process: Silicon Deep Etching Detail - ...
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2005 Mattson Technology, Inc Aspen III ICPHT
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Mattson Technology, Inc. Aspen III ICPHT Stripper/Asher MFG Date: 2005 EQUIPMENT DETAILS: Mat...
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Applied Materials 8330
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Applied Materials 8330 Metal Etch 150 mm system for etching Metal
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2001 Tokyo Electron Ltd. NS 300
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Tokyo Electron Ltd. NS 300 Wafer Scrubber MFG Date: 2001 EQUIPMENT DETAILS: • Currently Config...
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Applied Materials Centura AP Enabler
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Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size ...
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Shibaura Engineering Works Ltd. CDE-300
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Shibaura Engineering Works Ltd. CDE-300 Metal Etch Currently Configured for 300mm wafer size E...
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