Shibaura Engineering Works Ltd. CDE-300
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Shibaura Engineering Works Ltd. CDE-300
Metal Etch
Currently Configured for 300mm wafer size
H...
ENI ENI 000-1093-75, LAM P/N 685-495681-008 RF Match
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Sold as is or with 2 new capacitors and a warranty
Tokyo Electron Ltd. Cellesta+
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Cellesta+ Tokyo Electron Ltd. Single Wafer Processing Etch/Clean - Wet Processing
2022 TEL Front End Module
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Front End Module for a Vintage 2022 TEL Etch System.
Tokyo Electron Miyagi LTD
Loader Module
B...
AMAT P5000
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The warehouse is full of mainframes, chambers, rf racks, parts and components to fully rebuild a ...
1996 Gasonics L3510
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GASONIC L3510 Single Wafer Downstream
Photoresist Asher
8” configured (can change to 6” )
Quar...
Novellus Concept 2
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Working condition
200MM, PVD SYSTEM
(1) DEGAS CHAMBER
(1) DAMACLEAN ETCH MODULE
(1) TA PVD CH...
2001 STS MESC Multiplex ICP ASE
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STS ASE Multiplex ICP System (Bosch Process)
OEM = Surface Technology Systems Limited (AKA: STS)...
AMAT CENTURA 5200 MXP Plus etch system
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AMAT CENTURA 5200 for sale
Included:
- main frame,
- one MXP+ chamber body,
- power AC rack,
- ...
2001 Tokyo Electron Ltd. NS 300
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Tokyo Electron Ltd. NS 300 Wafer Scrubber
MFG Date: 2001
EQUIPMENT DETAILS:
• Currently Config...
Applied Materials Centura AP Enabler
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Applied Materials Centura AP Enabler
Dielectric Etch
Currently Configured for 300mm wafer size
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