1996 Gasonics L3510

GASONIC L3510 Single Wafer Downstream

Photoresist Asher

8” configured (can change to 6” )

Quartz Plasma Tube and Baffles

ASTEX Microwave 1.2kw

Temperature Controlled

Wafer Cooled

Aluminum Process Chamber

Robotic Pick and Place Wafer Handler ( KORO )

Fixed Position Single Cassette Station

Post Process Cooling Station

Downstream End Point Detection

SEMI SECS ⅱ Software

2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm

System Power : 208 VAC , 60 A, 3 Phase, 50/60Hz