Varian 300XP

Configuration

-Implanter: Dual end-stations setup for 6" wafers

-Implant angle: 0 – 7 degrees

-Source type: Freeman ion source

-Scan Amp: Brookhaven X and Y Scan master amplifiers.

-Beam energy probe: 0 -200 KV beam energy probe.

-Beam monitor: Remote beam monitor on control console.

-Extraction: Variable (0 – 35) KV

-Platen: Standard 300XP grounded platen on ES#1 & 2. Corner cup integration

-Source rough pump: Alcatel 2012, 3 phase.

-B/L Rough pump: Alcatel 2012/2008, single phase

-E/S Rough pump: Alcatel 2012/2008, single phase

-LOAD LOCK pump: Alcatel 2012/2008, single phase

-Source Hi-Vac pump: Varian VHS 4 diffusion pump

-VARIAN B/L Hi-Vac pump with CTI-8 Cryo pump

-VARIAN E/S Hi-Vac pump with CTI-8 Cryo pump

-CTI Compressors.

-Accel / Decel power supply kit: standard (-2KV)

-AMU: 0 – 124 amu

-Ion beam filter: N/A but compatible.

-Process control terminal: 486 with remote control console.

-XP scan controller Dosimetry system.

Gas system: 4 gas system (3 MFC, 1 HP for boron) SDS gas control system.

Fiber optic control interface between high voltage terminal and ground level controls.