1995 TEL Mark-8 CLEAN Track System 2-Coater/2-Developer

Missing parts:

FC-9821Ke Controller

Robotic arm assembly and board

ADH/Adhesion Unit

4x LHP units

2x Cool Plate units

WDS

4x RKC Controllers

a-1. Wafer Size: 200mm Dual Block System

b-1. Wafer Flow: Right to Left

CSB unit is in right side and interface station unit is in left side

c-1. Process Block: 2ea.

d-1. Block #1

aa. TEL Clean Track Mark 8 FC-9821Ke Controller: Missing

bb. Stage/Indexer: SMIF/Cassette Station

cc. CSA/Cassette Station Arm: 1ea.

e-1. Block #2

Normal Photo Resist Coat 2-1, 2-2 Units:

- 2ea. normal photo resist dispense nozzles per coat

- Total 2 normal photo resist dispense nozzles and 2 RRC resist pump per coat unit

- 1-side rinse nozzle (programmable side rinse EBR) for normal coat unit

- Dual back rinse nozzle

- Installed photo resist temperature control

- Installed motor flange temperature control

- Photo resist drain type: Direct gravity drain type

- Photo resist bottle quantity: 2 spaces

- Installed photo resist auto exchange

- Installed dummy dispense system

- Cup type: PP for upper cup and inner cup

- Auto damper: Cylinder only

f-1. Block #3

aa. Develop 3-1, 3-2 units:

- Single E2 nozzle for develop unit

- Dual top rinse nozzle for develop unit

- Installed back rinse nozzles for develop unit

- Installed develop temperature control

- Installed motor flange temperature control

- Drain type: Direct gravity drain type

- Installed auto damper

- Installed auto dummy dispense system

- Cup type: Stainless steel for upper cup and PP for inner cup

bb. PRA/Process Block Robotics Arm: 2ea/Missing assembly with board

cc. ADH/Adhesion Unit: 2ea/missing

dd. LHP/Low Temperature Oven Unit: 2ea/4ea missing

ee. COL/Cool Plate Unit: 4ea/2ea missing

ff. WDS/Washing Disk Stock: Missing

g-1. THC/Temperature and Humidity Controller: 1ea/ TEL OEM 2-CUP Shinwa T&H

Missing 4ea RKC controller

h-1. External Chemical Supply System:

aa. 1st. Section: Solvent Supply System

- Solvent Chemical type: 1ea.

- Chemical Center Supply System (CCSS) with 2 of 3liter Teflon Buffer Tank

- Tank Type: 2-Buffer tank (3liter tank, Teflon) to cover two coat units.

bb. 2nd. Section: Develop Supply System

- Develop Chemical type: 1ea.

- Chemical Center Supply System (CCSS) with 2 of 3liter Teflon Buffer Tank

- Tank Type: 2-Buffer tank (3liter tank, Teflon) to cover two DEV units.

i-1. HMDS Supply System for 2 AD Unit

- Chemical Type: 1ea

- Chemical 1/4gal. Bottle with 1L Buffer Tank

- Tank Auto Switch-off/Exchange: N/A

j-1. TEL OEM SMC Multi Controller: 1ea. @ rear main body

k-1. Power Transformer AC Cabinet: 208Vac, 3-Phase, 50/60Hz

4. Sales Condition

As-is/Where-is