2011 Ulvac Entron-EX W300

PVD (Physical Vapor Deposition)

Deposition Equipment

Currently Configured for: 300mm

Asset HDD not included

Multi-Chamber Sputtering System

ENTRON-EX W300T Triple Gun Cathode Tool

Software Version : Ver. 332-A2

System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz

Loading Configuration: 3 Load Ports

Chm Position F1 PVD Sputter ( 3C ) AR , N2

Chm Position F2 PVD Sputter ( 3C ) AR , N2

Chm Position F4 PVD Sputter ( 3C ) AR , N2

Chm Position B1/B2 Degas Chambers

F1,F2,F4 - PVD Chambers ( 3C Sputter process )

B1/B2 - Degas Chambers (Remove moist layer )

System is not configured with substrate bias.

System utilizes AE MDX 1K