MRC 643

Fully operational when de-installed

Original MRC computer controlled

Configured for Ultra-high purity deposition

3 Magnetron sputter targets-5”x15” DC or RF targets, Contains 3 KDF plainer cathodes. Current targets

are Ti, Ni, and AlSi

13 inch by 13 inchpallet size

6kW Quartz heaters in load lock for baking out wafers

Typical System base 1.5x10-7

Vacuum Equipment:

-Main chamber pump: CTI-8

-Load lock pump: CTI-100

-Roughing: Edwards E2M40

-Cryo Compressor: CTI-Cryogenics 9600

-MKS eVision RGA (100 AMU)

Power System:

-Power is 208V 125A 3 Phase

-RF Power supply MRC tube 3kW generator

-DC Power supply MRC SCR 10kW at open voltage >1500 VDC

System has been use to deposit Al, AlSi, Ni, Ti and TaSi