1995 TEL MARK 7 1C2D

Wafer Size: 8-inch

Year of Manufacture: 1995

General Configuration

a. Wafer Size: 200mm, Single Block System

b. Wafer Flow: Right to Left (Off-Line)

c. Process Block: 1ea (Single Block System)

d. Block #1

d-1. TEL Clean Track Mark 8 FC-9801F Controller

d-2. Stage/Indexer: Non SMIF/Open Uni-Cassette CS/Cassette Station

d-3. CSA/Cassette Station Arm: 1ea.

e. Block #2

e-1. Normal Photo Resist Coat 2-1 Unit

3 Normal Photo Resist Dispense Nozzles: Missing pump

1 Solvent Pre-wet RRC/Reduced Resist Coat Nozzle: Missing

1 Side Rinse Nozzle (Programmable Side Rinse EBR)

- Missing Dual Back Rinse Nozzles

Photo Resist Temperature Control: Installed

Motor Flange Temperature Control: Installed

- Missing Circulator Pump

- Missing Spin Motor

- Missing Cup

Photo Resist Drain Type: Direct Gravity Drain Type

Photo Resist Bottle Quantity: 6ea.

Photo Resist Auto Exchange: N/A

Auto Dummy Dispense System: Installed

e-2. Develop 2-2 Unit

Stream Nozzle (E2 Nozzle Bath type)

2-Rinse Nozzle

Dual Back Rinse Nozzles

Develop Temperature Control: Installed

Motor Flange Temperature Control: Installed

- Missing Spin Chuck

Drain Type: Direct Gravity Drain Type

Auto Damper: Installed

Auto Dummy Dispense System: Installed

Cup Type: Stainless Steel for Upper Cup and PP for Inner Cup

e-3. Develop 2-3 Unit

Stream Nozzle (E2 Nozzle Bath type)

2-Rinse Nozzle

Dual Back Rinse

Develop Temperature Control: Installed

Motor Flange Temperature Control: Installed

- Missing Circulator Pump

Drain Type: Direct Gravity Drain Type

Auto Damper: Installed

Auto Dummy Dispense System: Installed

Cup Type: Stainless Steel for Upper Cup and PP for Inner Cup

f. THC/Temperature and Humidity Controller: 1ea

TEL OEM SHINWA T&H (1Cup)

g. TEL OEM SMC Multi Controller: 1ea at External Chemical Supply Rack

h. External Solvent and Develop Solutions Chemical Supply System

h-1. 1st. Section: Solvent Supply System

Solvent Chemical Type: 1ea.

CSSS to Auto Supply System with Two of Buffer Tanks

Tank Type: 2 Buffer Tanks (3 Liter/Tank, Teflon)

Tank Auto Switch-off/Exchange: Installed

h-2. 2nd. Section: Develop Supply System

Develop Solution Chemical Type: 1ea.

CSSS to Auto Supply System with Two of Buffer Tanks

Tank Type: 2 Buffer Tanks (3 Liter/Tank, Teflon)

Tank Auto Switch-off/Exchange: Installed

h-3. 3rd. Section: Photo Resist Supply System for Normal Coater 2-1 Unit

Total 6 Bottles of Manual Supply Type

i. HMDS Supply System for 1 ADH Units in 2Block at Under Spin Unit