Karl Suss MA56 Mask Aligner

Karl Suss MA56 Mask Aligner

The Karl Suss MA 56 is a mask alignment and exposure

system which offers unsurpassed, highly economical mass

production capabilities for cassette to cassette handling of

wafers up to 4" wafers and 5" masks, although smaller

wafers and chips may be mounted to a 4" carrier wafer and

processed.  The light sources are a 30 W Deuterium lamp

with 310 nm wavelength and a 350 W mercury arc lamp with

365 nm wavelength.  The vacuum contact mode is available.  

The microscope has dual alignment objectives and

split-field viewing.  The mask and microscope have

motorized motion in x and y, and they may be moved

together or independently over the stationary wafer.