Nikon NSR-SF120 i-Line Stepper

Description: i-Line Stepper Manufacturer: Nikon Model: NSR-SF120 Wafer Size: 12 inch Configuration: # Item Detail 1          Exposing source i-line(Wavelength 365nm) 2          Surface illumination (standard) 1000[mW/cm2]or more 3          Reduction ratio 1：4 4          Throughput (1) FIA-EGA 100wafer/hour or more -    Step pitch 25nm×33mm (2) LSA-EGA 90wafer/hour or more -    76shot (300mm wafers) -    Exposure amount 90mJ/cm2 5          Resolution 280nm or less 6          Alignment accuracy 35nm or less (M+ 3σ) 7          Lighting NA Three equipped with Squeezing (1)  NA：0.43 CONV (2)  NA：0.36 CONV (3) I-NA：0.50 2/3Ann 8          Projection lens NA Variable 0.50~0.62 9          VRA angle, exposure range Two Type 26×33mm, 25×33mm (Scan Field) 10        Wafer alignment FIA/LSA 11        LC control Adjust only 25×33mm 12        Reticle Buffer Max 14sheet 13        Reticle Load Port 2 14        Cool plate before exposure None 15        Options PPD (Pellicle on particle inspection device, 2D barcode ,WL front In-line), Relay FOUP unit