2014 Novellus Systems Inc. Concept Three Altus Max EFX

2014 Novellus Systems Inc. Concept Three Altus Max EFX

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Description

Novellus Systems Inc. Concept Three Altus Max EFX WCVD (Chemical Vapor Deposition)

Currently Configured for 300mm wafer size

MFG Date: 2014

EQUIPMENT DETAILS:

Inspect to confirm configuration and condition.

※ Configuration :

Software Version : 192.168.1.99

System is on-line

Can produce wafers as is

All Cables are present

Primary user interface loc on the right

The chamber pump is Edwards-TXH1210*1ea

The WTS pump is Edwards-TXH1820

※ Gas Box Configuration :

Gas Line Gas Flow(sccm) MFC(Mfgr.) MFC(Model)

1 Ar 20000 Brooks GF125

2 SiH4 500 Brooks GF125

3 H2 30000 Brooks GF125

4 Ar 20000 Brooks GF125

5 WF6 500 Brooks GF125

B N2 10000 Brooks GF125

C Ar 20000 Brooks GF125

8 Ar 20000 Brooks GF125

D Ar 5000 Brooks GF125

E WF6 5000 Brooks GF125

F Ar 5000 Brooks GF125

G SiH4 500 Brooks GF125

I NF3 10000 Brooks GF125

Gas Line Gas Flow(sccm) MFC(Mfgr.) MFC(Model)

J WF6 500 Brooks GF125

K WF6 500 Brooks GF125

X 5%B2H6/N2 500 Brooks GF125

N 5%B2H6/N2 750 Brooks GF125

Specifications

ManufacturerNovellus Systems Inc.
ModelConcept Three Altus Max EFX
Year2014
ConditionUsed
Stock Numberem1200