2007 Sokudo Co., Ltd. RF-300A

Sokudo Co., Ltd. RF-300A Multi Block (Resist Coater/Developer)

Currently Configured for 300mm wafer size

MFG Date: 2007

EQUIPMENT DETAILS:

Process: Track

MC Configuration (# COT/# DEV): 3 COT/ 5 DEV

Wafer Direction (RtoL or LtoR): L to R

Accessory

AC Power BOX

- AC Power Cable : 3 Phase

COATER Units

1) Unit

- Resist Nozzles (Qty):8

- Resist Pumps (type): PDS 105C

- EBR / RRC /

- Temp/Humidity Sensor: Y

- PR auto exchange system: Y

- Photo resist temperature controll installed: Y

- Motor Flange temperature controll installed: Y

Develop Units

1) 3-1 Unit

- Rinse: Top rinse (qty nozzles) 1

- Developer Temp control installed: Y

- Auto damper installed: Y

- Auto dummy rainse installed: Y

All Units Q`ty

- Coater units (Qty): 3

- Develop units (Qty): 5

- AHL units (Qty):3

- P-RHP units (Qty):10

- HP units (Qty):3

- RHP units (Qty):3

- CP units (Qty):6

- ADH units (Qty):3

- TRS units (Qty):4

- WEE Units (Qty):2

- PEB Units (Qty):4

- IRA Block: Y

- CSB: Y

-TRS: Y