STS / SPTS MACS ICP HR Etch Systems

STS / SPTS MACS ICP HR Etch Systems

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Available quantity: 2

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Description

STS / SPTS MACS ICP HR Etch System, 8"

- Advanced Silicon Etch (ASE) with Bosch process

- HR Chamber for High Rate Etch

- Set up for 200mm wafer (150mm-200mm capable)

- MACs Loader for Cassette to Cassette operation (2 load stations)

- Carousel vacuum load lock

- Helium Backside Cooling (HBC)

- HBC Assy: ICP V2

- Clamp Type: Standard WTC

- Lower Electrode: ICP WTC Tripod Lift

- Chamber Insulation Jackets: None

Chiller: Affinity

Vacuum System:

- Turbo Pump: LEYBOLD MAG 2000

- Load Lock Pump: EBARA AA10

- Chamber Pump: EBARA A30W

Gases: C4F8(200 sccm)、SF6(1000 sccm)、O2(2000 sccm)、N2 (500 sccm)

RF Generators:

- Coil RF Power : ENI GHW-50Z 5kw

- Platen RF Power : ENI ACG-3B 13.56MHZ, 300W

- 380 volt

2003 Vintage


STS / SPTS MACS ICP ETCH System, 6" - 8"

- ASE with Bosch process

- HR Chamber for High Rate Etch

- MACs Loader for Cassette to Cassette Operation (2 Load stations)

- Carousel vacuum load lock

- Helium Backside Cooling

- Clamp type: Standard WTC

- RF Generators: AE RFG3001, ENI ACG-3B

- Gases:

C4F8(200 sccm)、SF6(1000 sccm)、O2(200 sccm)、Ar (50 sccm)

- Load lock pump: Ebara AAL 10

- Chamber pump: Ebara A 30 W

- Chiller: Affinity PWG-160 L- BE 27 CBD 2

2001 Vintage

208 volt

Specifications

ManufacturerSTS / SPTS MACS ICP HR Etch Systems
ConditionUsed
Stock Numberem2208