2012 Raith eLINE Plus EBL System

Raith eLINE Plus EBL system (installed 2012)

·         Main system

·         Electronics control rack

·         Diaphragm vacuum pump

·         UPS

·         Chiller

• Smallest beam size in the world of a professional EBL system
• Ultra-high resolution patterning (sub-5 nm linewidth in EBL resist, sub-7 nm lines

using electron beam induced deposition (EBID) techniques achievable)

• Unique continuous stitch-error free writing modes, traxx and periodixx
• Uncompromising EBL infrastructure with complementary in-situ nanoengineering

options for broadest bandwidth of applications

• Smart nanomanipulators for in-situ nanoprobing and nanoprofilometry
• Professional gas injection system for focused electron beam induced processes

(FEBIP) such as deposition, etching or 3D nanosculpturing

• Upgradability at any time and open platform concept for customization
• Comprehensive Raith Nanosuite software with true multi-user management

Multi Technique Electron Beam Lithography

Product specifications

• Beam energy 20 eV – 30 keV
• Beam current 5 pA – 20 nA
• Writing speed 0.125 Hz – 20 MHz pixel frequency
• Stage travel range / sample size 100 mm / ≤ 4 inch wafer
• Beam size ≤ 1.6 nm @ 20 keV
• Beam current density ≥ 7500 A / cm2
• Beam current drift ≤ 0,5% / 8 hours
• Minimum grating periodicity ≤ 40 nm
• Minimum linewidth ≤ 8 nm
• Stitching accuracy ≤ 40 nm (mean+3σ)
• Overlay accuracy ≤ 40 nm (mean+3σ)

Raith eLINE Plus Electron Beam Lithography System – Multi-Disciplinary Nanofabrication Tool

For sale: Raith eLINE Plus e-beam lithography system, engineered for high-precision patterning and nanoscale fabrication across a wide range of scientific and industrial research applications.

System Highlights:

• High-resolution electron beam lithography
• Ideal for R&D labs, universities, and nanotechnology centers
• Supports complex patterning, imaging, and nanocharacterization workflows

Application Areas:

• Nano-Photonics: Photonic crystals, gratings, waveguides
• Quantum Devices: Quantum dots, CNT graphene, SETs, nanowires
• Nano-Electronics: Spintronics, molecular electronics, nano-imprint lithography
• Energy Devices: Solar cells, fuel cells, nano-catalysts
• Materials Science: Nano-composites, meta-materials, self-assembly
• Nano-Biotech & Medicine: Micro/nano-fluidics, implants, biosensors
• MEMS/NEMS: Nano-mechanical devices, magneto-resistive elements

Integrated Capabilities Include:

• Precision lithography with advanced control
• Electrical & mechanical probing
• AFM support
• EBID/EBIE for direct-write applications
• Profilometry, navigation, and metrology functions
• Chemical & structural analysis

This Raith eLINE Plus is ideal for interdisciplinary nanofabrication projects requiring reliability, resolution, and application flexibility.

Contact us for pricing, system condition, and configuration details. Worldwide shipping available.