2005 AMAT Producer

Equipment PECVD Deposition platform

Brand APPLIED MATERIALS

Model Producer

Wafer size configuration 300mm, and 200mm with holder

Chambers 2 chambers + 1 UV annealing chamber

Processes SiO2 ; SiN ; SiOCH ; Cure UV

Non-functional module UV annealing chamber: only one of the two reactors is operational

Never been used module none

Spares Parts none

Equipment manufacturer's data sheet none

In relatively good working order (except for the UV annealing chamber where only one of the two reactors is operational).

Vintage : 2005

Wafer size configuration : 300mm, and 200mm with holder

Chambers : 2 chambers + 1 UV annealing chamber.