2007 Nikon NSR-307E Scanner

Nikon NSR-S307E ArF 300mm Wafer Stepper (2007)

Overview

Available for sale is a Nikon NSR-S307E advanced photolithography system, designed for high-volume semiconductor manufacturing. This system utilizes 193nm ArF excimer laser technology, enabling fine patterning down to sub-100nm nodes.

The NSR-S307E is well-regarded for its precision alignment and stable overlay performance, making it suitable for logic, memory, and advanced device fabrication environments.

Key Specifications

• Manufacturer: Nikon
• Model: NSR-S307E
• Year (Vintage): 2007
• Wafer Size: 300mm
• Exposure Light Source: ArF Excimer Laser
• Wavelength: 193 nm
• Numerical Aperture (NA): 0.85
• Resolution: 80 nm
• Alignment Accuracy: 12 nm
• Exposure Field: 26 x 33 mm
• Reduction Ratio: 4:1

Highlights

• Industry-standard 193nm ArF lithography platform
• Capable of ~80nm resolution for advanced nodes
• High precision 12nm alignment accuracy
• Optimized for 300mm wafer production
• Proven platform for high-throughput fab environments