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2014 LAM/ Novellus Concept One-200 PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Date of Manufacture: 2014-05-08 Current...
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LAM/ Novellus Concept One-200 PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm PSG Dep...
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LAM/ Novellus Concept One-200 PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm PSG Dep...
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2000 LAM/ Novellus Concept Two Dual Altus W-CVD (Chemical Vapor Deposition)
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- SCON - Software: 2.45 B 39 - CIM: SECs - Process: Tungsten CVD Process - Handler System: Ma...
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LAM/ Novellus VECTOR
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6 available PECVD (Chemical Vapor Deposition) Deposition Equipment 300mm
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