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1995 TEL Mark Vz 2C2D Track
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Vintage: 1995 2C2D Track
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2006 TEL INDY
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2006 TEL INDY Furnace Anneal WAFER SIZE: 12
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1996 TEL Alpha-808SC
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Vintage: 1996 Wafer size: 8" Configuration overview: Batch of 150wfr Tool status: running/ wor...
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1997 TEL TE8500
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Vintage: 1997(2) Wafer size: 8" Configuration overview: 1ch:EB (2) Tool status: Offline, work...
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2003 TEL FORMULA
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Wafer size: 300mm Category: diffusion Process: ALO Furnace Pics 1-8 = tool 1 Pics 9-16 = tool 2
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2010 TEL INDY PLUS
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Process: BCD PLOY Condition: AS-IS Wafer size: 12"
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TEL Trias SPA
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Type: Chemical Vapor Deposition (CVD) Equipment Configuration: – 2 Chambers
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2006 TEL α-303I
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Vintage: 2006 (2) 2004 (1) Wafer size: 300mm Process: DIFF
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2008 TEL TRIAS
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Category: thin film CVD Process: PECVD-Oxynitride Wafer size: 300mm
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2006 TEL Indy
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Process: DIFFUSION Wafer Size: 300mm Category: diffusion Equipment: furnace Process: anneal
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2011 TEL INDY PLUS
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Process: DIFFUSION Wafer Size: 300mm Equipment: furnace Process: HfO2-ALD
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2003 TEL TRIAS
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Wafer Size: 300mm Process: CVD Category: Thin film
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