2005 AMAT AKT 1600 PECVD GEN 2 & 2.5

AMAT AKT 1600

PECVD process iN , SiO2,

i a Si, SiON and N+ a Si

Process : PECVD iN,SiO2, i a Si, SiON and N+ a Si

• Software Version: AKT7.3

• System Power Rating: 208 VAC 3

Phase

• Flat panel

size : 320 x 352 mm

(5)Process chambers :

• Film Capability SiN

• SiO2

• i-a-Si

• SiON

• N+ a Si (Remote Plasma Clean)

Includes:

•Chillers