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2010 DNS Dainippon Screen SU-3000
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Vintage 2010 Wafer size: 300mm Wet Process – HF Clean **NO HDD will be included with this tool...
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2012 TEL LITHIUS
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Wafer Size: 300mm Category: Photo Equipment: track Process: Coater / Developer 4C3D/2Block Co...
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2007 Ulvac NE-5700
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Wafer Size: 150mm Category: Etch Process: Metal Etcher Equipment: Dry Etcher
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2010 WONIK IPS AKRA
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Wafer size: 12" Process: Ti/TiN Category: Thin film Equipment: CVD
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1998 Plasmatherm SLR-770 ICP
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Wafer Size: 100mm Category: Etch Equipment: ICP ETCH Process: Silicon Deep Etching
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SSEC 203
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Wafer Cleaner
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2011 Lam Vector Express AHM
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Wafer size: 300mm Process: PECVD Category: Thin film
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2003 TEL FORMULA
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Wafer size: 300mm Category: diffusion Process: ALO Furnace Pics 1-8 = tool 1 Pics 9-16 = tool 2
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2003 TEL TRIAS
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Wafer Size: 300mm Process: CVD Category: Thin film
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2007 TEL INDY
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Process: DIFFUSION Wafer Size: 300mm Category: Diffusion Furnace Process: ALD SiN
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2008 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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2010 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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