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2000 LAM Alliance (A6) TCP 9600PTX
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Metal Etch Etch/Ash/Clean - Plasma Processing Date of Manufacture: 2000-01-01 Currently Config...
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2000 LAM Alliance (A6) TCP 9600PTX
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Metal Etch Etch/Ash/Clean - Plasma Processing Date of Manufacture: 2000-01-01 Currently Config...
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TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Currently Configured for: 20...
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TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Currently Configured for: 20...
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TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Currently Configured for: 20...
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TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Currently Configured for: 20...
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2004 KLA Surfscan SP1 TBI
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Particle Measurement Metrology Equipment Date of Manufacture: 2004-08-01 Currently Configured ...
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2019 KLA Altair 8920
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Darkfield Inspection Metrology Equipment Date of Manufacture: 2019-07-01 Currently Configured ...
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ASML PAS 5500/700D
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248nm (KrF) Scanner Lithography Equipment Currently Configured for: 200mm PAS 5500 Stepper 700...
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1999 AMAT Centura 5200 HTF - ATM EPI
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Epitaxial Silicon (EPI) Deposition Equipment Date of Manufacture: 1999-01-01 Currently Configu...
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2000 AMAT Producer S PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Date of Manufacture: 2000-01-01 Current...
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2000 AMAT Producer S PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Date of Manufacture: 2000-01-01 Current...
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