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Wafer Bonder Wafer Level Packaging Date of Manufacture: 2002-12-31 Currently Configured for: 2...

Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2011-12-31 Currently Config...

With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged

Single Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1998-12...

10"x10" programmable hot plate for max 200mm wafers Inert gas purge in lid

10"x10" Programmable hot plate for max 200mm wafers

Includes 2 Manostat peristaltic pumps for photoresist dispense max 5" diameter substrate or 4"x4...

10 available Vintages: 2012 (1), 2011 (2), 2010 (3), 2009 (1), 2007 (3) Power ON Hinge: MHF400...

Multi Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1997-12-...

- Condition: Perfect working order. - Year of production: 2016 - Is software included with PC? Ye...

Vacuum furnace Sold in working condition Maximum operating temperature: 450°C Minimum vacuum le...

150 / 200 mm The tool needs some refub work, but can be sold either way.