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2003 TEL FORMULA
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Wafer size: 300mm Category: diffusion Process: ALO Furnace Pics 1-8 = tool 1 Pics 9-16 = tool 2
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Carbolite HT 628 CR 2416 OTC
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Type: High Temperature Convection Oven Equipment Configuration: With: – Eurotherm E3508P1 Digit...
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Plasma Etch BT 1
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Equipment Configuration: – set up for oxygen plasma cleaning of aluminum parts
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Lyncee Tec DHM R 2100
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Zeiss ZSML 200
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Ramgraber IPA
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Type: Isopropanol Vapor Dryer Equipment Configuration: – set up for 100mm wafer boats
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ESEC 3088
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Type: Wire Bonder
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JET JTM-4 VS
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Variable Speed Turret Mill
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Nikon XY Stage for Nikon Optiphot 200
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Motorized stage, but can be operated manually 200mmx 180mm internal stage Sold As Is
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Nikon Optiphot 200 Trinocular Head Mounting Bracket
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JVC Digital Camera TK-C1381EG and TV lens
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Tested working condition removed from Nikon Optiphot 200 Microscope
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Nikon CF Plan 100X Objective
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tested working condition Screw Diameter 26mm
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