Buy Equipment

12" WAFER 4 available As-is

System accuracy: < 5 μm 3σ Printable area: 327 x 227 mm (DIN A4) Substrate thickness: max. 25 m...

Operating temperatures from 5°C above room temperature up to 250°C Capacity: 115 L Natural air ...

The Spin Rinse Dryer is used for rinsing and drying substrates. Max. size: 8" low profile, NOT A...

Up to 12" - The Spin Rinse Dryer is used for rinsing and drying substrates up to 12" round or 7"...

- thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 2...

• climate and humidity testing, with or without irradiation • e.g. to test different climatic zo...

Cold light source Olympus KLA 1500 LCD (many) with ring light and cable The KL 1500 LCD halogen ...

2008 No feeders As is running condition

Mask Aligner Karl Suss MA 100e/150e (refurbished by expert), TSA, up to 4”, or 6” Wafer or Substr...

Transport section (magazine to magazine) including heatable component holder for Wirebonder Hesse...

Double Head (refurbished and checked through specialist) - Double head, multichip - 2 pieces V...