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KLA TENCOR 8100 CD SEM ASSY Software V3.1.2 Date 06.02.2000 KLA Part Number: 900-01003-120 ASSY...

Nanometrics 4000 Film Thickness Measurement System Model Number 7200-1821 Rev B 150 mm Wafer Co...

2011 RUDOLPH MetaPulse-III 300XCu Metal Thickness WAFER SIZE: 12

Leica INS3300 is the most advanced solution in the production control of 200 mm and 300 mm wafers...

Batch Forced Convection Reflow Oven - Maximum Temperature 300 ºC (572 ºF, 573 ºK) - Other Inform...

The NanoSpec 6100 is a fast, reliable, low cost tabletop film thickness and mapping system that p...

Turbopumped Leak Detector Rollaround Console Configuration for Device Testing Liquid Nitrogen Co...

Film Thickness Monitor Ellipsometer

Profilometer - Date of Mfg: 4/92 - ±10 mm Scan Length - 2 to 250 µm/sec Scan Speed - 50/sec nomi...

CD SEM Measurement Tool - Wafer Size Range Minimum 100 mm Maximum 150 mm Set Size 150 mm - Reso...

Xray System XRAY Wafer Analyzer Power Requirements 240 V 2.5 A 47-63 Hz 1 Phase CE Marked YES