FEI QUANTA 200 3D DualBeam FIB

The FEI Quanta 200 3D Dual Beam SEM is equipped with a Ga Ion Source.

Capable of surface imaging at ~ 1nm resolution.

This instrument is a cutting-edge system capable of imaging and micro machining.

The instrument is capable of 1.2nm resolution at 30kV with the SE Detector.

FIB resolution is 5-7nm.

Ga Ion source has an acceleration voltage of 2kV to 30kV, and the ESEM resolution is 1.5nm.

Maximum Sample Dimensions

Maximum dimensions 150 x 100 x 25 mm will allow full stage movements

The operators manual is available to download below.