Applied Materials P 5000 Mark II-J

Chemical Vapor Deposition (CVD)

Wafer Size: 

Equipment Configuration: – SBC Board Model: SV21

– Cassette Indexer: 6″ Clamp

– Elevator: 8 Slot

– Monitors: Qty 2

– Robots: Phase III

– Robot Blade: Standard Vacuum

– Wafer Sensor: Cap sensor

– Scrubber: New tech wave scrubber / NTWP601HW, 2 units

– Pump: Process pump 4 units / Edward IQDP80+QMB500

– Floppy: 3.5″ SCSI Driver

Chamber:

– Position: A/B/C/D

– Type: DLH 1-hole

– Process: SiH4 Oxide

– Heater type: lamp

– Susceptor type: AL

– Matcher: 4

– Throttle Valve: Delta Nitride Dual Spring

– Gas panel: Standard 20 channel

– Gas supply: Top down

– Manual valve: Fujikin