2004 EVG IQ Aligner

Reticle Quartz

Wafer Size 200 mm

Wafer Type Notch

Reticle size 8 inch

Lens Registration error <2um ; for alignment mark

<3um ; for the mean of 9 lens

Lens profile repeatability 0.3µm repeatability (wafer to wafer)

Single side imprint alignment accuracy ± 2 µm

Imprint thickness 50+/- 5 um

Lens de-center (second side imprint alignment accuracy) ± 3 µm

Imprint thickness 50+/- 5 um

Lamp type Mercury lamp

UV light uniformity ± 5 %

UV Light Intensity 0.5~20mW